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Specializing in high-tech fields such as materials, semiconductors, electronics, information technology, and mechatronics
Photoresist
Photoresist Supporting Reagents
Sputtering Targets
Wafer Bonding Materials
Photoresist
Electron Beam Photoresist
紫外光刻胶(Photoresist)
光刻胶性能优异,种类繁多,满足不同工艺的多样性要求 • 包装规格灵活多样 (30ml, 100ml, 250ml, 500ml, 1L, 2.5L 等 ),适合多种规模的科研 / 生产需求
AZ Photoresist Selection Series
The photoresists deliver outstanding performance with abundant types to meet diverse requirements of various processes
特殊工艺用光刻胶
光刻胶性能优异,种类繁多,满足不同工艺的多样性要求
电子束光刻胶 (e-beam resist)
光刻胶产品种类齐全,可以满足用户的各种个性化需求。
SOI绝缘硅片
代理英国ICEMOSTECH的高品质SOI wafer和 SuperJunction MOSFET。
硅外延片
硅外延工艺实际上是一种薄层的单晶生长技术,它是在一定的条件下,在硅单晶的衬底片上,沿单晶的结晶方向生长一层具有一定导电类型,电阻率、厚度、晶格结构与体单晶一致的新单晶层。
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