The company can provide lithium niobate single crystal thin films (LNOI) and lithium tantalate single crystal thin films (LTOI) in various specifications, models, and substrate schemes. Based on customers' specific needs, customized solutions can be provided.
Aluminum nitride single crystal thin film
Size: 4/6/8 inches
Thickness (LT): 300-900nm
Substrate: Silicon/Silicon Carbide/Quartz/Sapphire/Lithium Tantalate
Buried layer: [Material: silicon dioxide, thickness: 1000-4000 nanometers]
Special customized products
1. We can provide ultra-flat sheet products in different specifications and models
2. Special specifications such as magnesium doping and erbium doping are available
Technical Service
The company can provide multiple technical services for 4-inch/6-inch/8-inch wafers:
injection
grinding
Polishing
etching
bonding
LPCVD (silicon oxide, polysilicon)
PECVD (silicon oxide, silicon nitride)
PVD (silicon oxide)
High-temperature thermal oxidation
Metal deposition (Mo, Au, Al, Ti)
