Electron Beam Photoresist - SU-8 GM1010 / HSQ / XR-1541-002/004/006 / HSQ Fox-15/16 / PMMA Series
Product Models & Specifications are as follows:
| Electron Beam Photoresist | Model | Exposure Source | Type | Resolution | Film Thickness | Application Scope |
| SU-8 GM1010 | Electron Beam | Negative | 100nm | 0.1-0.2μm | Suitable for nanostructures with high aspect ratio | |
HSQ | Electron Beam | Negative | 6nm | 30nm-180nm | High resolution photoresist with excellent etching resistance | |
| XR-1541-002/004/006 | Electron Beam | Negative | 6nm | 30nm-180nm | High resolution photoresist with excellent etching resistance | |
| HSQ FOX-15/16 | Electron Beam | Negative | 100nm | 350nm-810nm | High resolution photoresist with excellent etching resistance | |
| Domestic PMMA | Electron Beam | Positive | / | High resolution, compatible with various electron beam processes | ||
| Imported PMMA | Electron Beam | Positive | / | High resolution, compatible with various electron beam processes |
