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TOK Group Photoresist Supporting Chemicals
TOK Group Photoresist Supporting Chemicals
TOK Group Photoresist Supporting Chemicals
Product Introduction:

Suitable for metal patterning in MEMS, packaging, biochip processes to avoid dry etching

Product Details

TOK

Supporting Chemicals

Product Type

Model

Packaging Spec.

Origin

EBR Thinner

OK73

Gallon / 5L / 20L / 200L

Changshu

PM thinner (PGMEA)

Gallon / 5L / 20L / 200L

Changshu

Developer

NMD-3 2.38%

Gallon / 5L / 20L / 200L

Changshu

NMD-W 2.38% (with surfactant)

Gallon / 5L / 20L / 200L

Changshu


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